IRingi yokuJonga yeSiC eSolid

Inkcazelo emfutshane:

IRingi ze-SiC Etch zeSemicera ziyilelwe ukusebenza okuphezulu kwe-semiconductor etching izicelo ezinokuqina okukhethekileyo kunye nokuchaneka. Yenziwe kwi-silicon carbide ecocekileyo ephezulu (i-SiC), le ring ye-etch igqwesa kwi-plasma etching, etching etching, kunye ne-wafer etching process. Inkqubo yokwenziwa kwe-Semicera ephucukileyo iqinisekisa ukuba le ringi ibonelela ngokugqwesileyo ukuxhathisa kunye nokuzinza kwe-thermal nakwezona ndawo zifuna kakhulu. Sijonge phambili ekubeni liqabane lakho lexesha elide eTshayina.


Iinkcukacha zeMveliso

Iithegi zeMveliso

I-Solid SiC Focus Ring evela kwi-Semicera licandelo elibukhali eliyilelwe ukuhlangabezana neemfuno zokwenza i-semiconductor ephucukileyo. Yenziwe ngokucoceka okuphezuluI-Silicon Carbide (SiC), le ring kugxilwe ilungele uluhlu olubanzi lwezicelo kushishino semiconductor, ingakumbi kwiIinkqubo ze-CVD SiC, ukufakwa kweplasma, kunyeI-ICPI-RIE (I-Inductively Coupled Plasma Reactive Ion Etching). Eyaziwayo ngokuxhatshazwa kwayo okungaqhelekanga, ukuzinza okuphezulu kwe-thermal, kunye nokucoceka, iqinisekisa ukusebenza okuhlala ixesha elide kwiindawo ezixinzelelekileyo.

Kwi-semiconductoriqhekezana lesonkaukusetyenzwa, i-Solid SiC Focus Rings ibalulekile ekugcineni i-etching echanekileyo ngexesha le-etching eyomileyo kunye ne-wafer etching applications. Iringi ye-SiC yokugxila inceda ekugxininiseni iplasma ngexesha leenkqubo ezifana nokusebenza koomatshini be-plasma, iyenza ibe yimfuneko ekufakweni kwee-wafers ze-silicon. Izinto eziqinileyo ze-SiC zinika ukuchasana okungenakuthelekiswa nanto kukhukuliseko, ukuqinisekisa ixesha elide lezixhobo zakho kunye nokunciphisa ixesha lokuphumla, okubalulekileyo ekugcineni ukukhutshwa okuphezulu kwi-semiconductor fabrication.

I-Solid SiC Focus Ring esuka kwi-Semicera yenzelwe ukumelana namaqondo obushushu agqithisileyo kunye neekhemikhali ezinobundlongondlongo eziqhele ukudibana nazo kwishishini le-semiconductor. Yenzelwe ngokukodwa ukusetyenziswa kwimisebenzi echanekileyo ephezulu njengeIingubo ze-CVD SiC, apho ubunyulu kunye nokuqina kubaluleke kakhulu. Ngokuchasana okugqwesileyo kumothuko we-thermal, le mveliso iqinisekisa ukusebenza okuhambelanayo kunye nokuzinza phantsi kweemeko ezinzima, kubandakanya ukuvezwa kwamaqondo aphezulu ngexesha.iqhekezana lesonkaiinkqubo etching.

malunga-ujoliso-ring-81956

Kwizicelo ze-semiconductor, apho ukuchaneka kunye nokuthembeka kungundoqo, i-Solid SiC Focus Ring idlala indima ebalulekileyo ekuphuculeni ukusebenza kakuhle kweenkqubo zokubhala. Uyilo lwayo oluqinileyo, oluphezulu luyenza ibe yinto ekhethekileyo kumashishini afuna amacandelo acocekileyo asebenza phantsi kweemeko ezinzima. Nokuba isetyenziswe kwiIringi ye-CVD SiCizicelo okanye njengenxalenye yenkqubo yokuchongwa kweplasma, iSemicera's Solid SiC Focus Ring inceda ekuphuculeni ukusebenza kwesixhobo sakho, inikezela ubomi obude kunye nokuthembeka kwemfuno yeenkqubo zakho zemveliso.

Ezona mpawu:

• Ukumelana nokunxiba okuphezulu kunye nokuzinza okuphezulu kwe-thermal
• Imathiriyeli ye-SiC ye-Solid ephezulu yokucoceka okongeziweyo
• Ifanelekile kwi-plasma etching, i-ICP RIE, kunye nezicelo zokucima okomileyo
• Ifanelekile kwi-wafer etching, ngakumbi kwiinkqubo ze-CVD SiC
• Ukusebenza okuthembekileyo kwiindawo eziphakamileyo kunye namaqondo okushisa aphezulu
• Ukuqinisekisa ukuchaneka kunye nokusebenza kakuhle ekufakweni kwee-wafers zesilicon

Usetyenziso:

• Iinkqubo ze-CVD SiC ekwenzeni i-semiconductor
• I-Plasma etching kunye ne-ICP RIE iinkqubo
• Iinkqubo zokuhombisa ezomileyo kunye ne-wafer etching
• Ukurhweba kunye nokufakwa koomatshini be-plasma etching
• Amacandelo achanekileyo amaringi ewafer kunye ne-CVD SiC rings

umfanekiso we-109

I-Microscopic morphology ye-CVD SiC surface

umfanekiso we-110

I-Microscopic morphology ye-CVD SiC cross-section

umfanekiso we-108
Semicera Indawo yokusebenzela
Indawo yokusebenza yeSemicera 2
Umatshini wezixhobo
Ukucutshungulwa kwe-CNN, ukucocwa kweekhemikhali, ukugquma kwe-CVD
Semicera Ware House
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