Inkcazo
Sigcina ukunyamezelana okusondele kakhulu xa sifaka isiceloUkwaleka kweSiC, usebenzisa i-high-precision machining ukuqinisekisa iprofayili ye-susceptor efanayo. Siphinda sivelise izixhobo ezineempawu ezifanelekileyo zokuxhathisa umbane ukuze zisetyenziswe kwiinkqubo ezitshisayo. Onke amacandelo agqityiweyo aza kunye nesatifikethi sokuthotyelwa kobunyulu kunye nobukhulu.
Inkampani yethu ibonelelaUkwaleka kweSiCinkqubo yeenkonzo nge-CVD indlela kumphezulu wegraphite, iiseramikhi kunye nezinye izinto, ukuze iigesi ezikhethekileyo eziqulathe carbon kunye nesilicon basabela kubushushu obuphezulu ukufumana iimolekyuli eziphakamileyo ze-SiC, iimolekyuli ezifakwe kumphezulu wezinto ezigqunywe, zenza i-SIC yokukhusela. I-SIC eyenziwe idityaniswe ngokuqinileyo kwisiseko segraphite, inika isiseko segraphite iipropati ezikhethekileyo, ngaloo ndlela yenza umphezulu we-graphite compact, i-Porosity-free, ukumelana nobushushu obuphezulu, ukuxhathisa kwe-corrosion kunye nokumelana ne-oxidation.
Inkqubo ye-CVD inikezela ubunyulu obuphezulu kakhulu kunye noxinaniso lwethiyoriUkwaleka kweSiCngaphandle kwe-porosity. Ngaphezu koko, njengoko i-silicon carbide inzima kakhulu, inokugudiswa kwindawo efana nesipili.I-CVD silicon carbide (SiC) yokugqumainikezele ngezinto ezininzi eziluncedo ezibandakanya ubunyulu obuphezulu kunye nokuqina kokunxiba. Njengoko iimveliso ezigqunyiweyo zisebenza kakuhle kwi-vacuum ephezulu kunye neemeko zobushushu obuphezulu, zilungele usetyenziso kwishishini le-semiconductor kunye nenye indawo ecocekileyo kakhulu. Sikwabonelela ngeemveliso zepyrolytic graphite (PG).
Iimpawu eziphambili
1. Ukumelana nobushushu obuphezulu be-oxidation:
Ukumelana ne-oxidation kusekuhle kakhulu xa ubushushu buphezulu ukuya kuma-1600 C.
2. Ukucoceka okuphezulu: okwenziwe nge-chemical vapour deposition phantsi kwemeko yokushisa kwe-chlorination ephezulu.
3. Ukumelana nokhukuliseko: ubunzima obuphezulu, indawo edibeneyo, iincinci ezincinci.
4. Ukumelana nokubola: i-asidi, i-alkali, ityuwa kunye nee-reagents eziphilayo.
IiNgcaciso eziphambili ze-CVD-SIC Coatings
SiC-CVD | ||
Ukuxinana | (g/cc) | 3.21 |
Amandla e-Flexural | (Mpa) | 470 |
Ukwandiswa kweThermal | (10-6/K) | 4 |
I-Thermal conductivity | (W/mK) | 300 |
Isicelo
I-CVD silicon carbide coating sele isetyenzisiwe kumashishini esemiconductor esele ifakiwe, njenge-MOCVD tray, RTP kunye ne-oxide etching chamber ekubeni i-silicon nitride inoxhathiso olukhulu lobushushu kwaye inokumelana neplasma yamandla aphezulu.
-I-Silicon carbide isetyenziswa ngokubanzi kwi-semiconductor kunye nokugqoka.
Isicelo
Ubunakho bokubonelela:
10000 Iqhekeza/Amaqhekeza ngenyanga
UkuPakisha kunye nokuhanjiswa:
Ukupakisha:Ukupakisha okuMgangatho & okuqinileyo
Ingxowa yePoly + Ibhokisi + Ikhathoni + Iphalethi
Izibuko:
Ningbo/Shenzhen/Shanghai
Ixesha lokukhokhela:
Ubuninzi (Amaqhekeza) | 1 - 1000 | >1000 |
Est. Ixesha(iintsuku) | 30 | Kuza kuthethathethwana |