Semicerauyakuvuyela ukunika iPFA Cassette, ukhetho lwe-premium yokuphatha i-wafer kwiindawo apho ukuchasana kweekhemikhali kunye nokuqina kubaluleke kakhulu. Iyilwe ukusuka kwizinto ezicocekileyo zePerfluoroalkoxy (PFA), le khasethi yenzelwe ukumelana nezona meko zinzima kulwakhiwo lwe-semiconductor, iqinisekisa ukhuseleko kunye nokuthembeka kweewafers zakho.
Ukunganyangeki kweMichiza engenakuthelekiswaIPFA Cassetteyenzelwe ukubonelela ukuchasana okuphezulu kuluhlu olubanzi lweekhemikhali, okwenza kube lukhetho olugqibeleleyo kwiinkqubo ezibandakanya i-acids enobudlova, i-solvents, kunye nezinye iikhemikhali ezibukhali. Olu xhathiso lwekhemikhali oluqinileyo luqinisekisa ukuba ikhasethi ihlala injalo kwaye iyasebenza nakwindawo ezonakalisa kakhulu, ngaloo ndlela yandisa ubomi bayo kwaye inciphisa isidingo sokutshintshwa rhoqo.
Ulwakhiwo olucocekileyo oluphezuluIiSemicera'sPFA Cassetteyenziwe ngezinto ezisulungekileyo zePFA, ezibaluleke kakhulu ekuthinteleni ungcoliseko ngexesha lokusetyenzwa kwe-wafer. Olu lwakhiwo lucoceke kakhulu lunciphisa umngcipheko wokuveliswa kwamasuntswana kunye nokuphuma kweekhemikhali, ukuqinisekisa ukuba iiwafa zakho zikhuselwe kubumdaka obunokubeka esichengeni umgangatho wazo.
Ukomelezwa koKuhlala kunye nokuSebenzaYenzelwe ukuqina, iPFA Cassetteigcina imfezeko yolwakhiwo phantsi kobushushu obugqithisileyo kunye neemeko ezingqongqo zokusetyenzwa. Nokuba ibonakaliswe kumaqondo obushushu aphezulu okanye iphantsi kokuphathwa ngokuphindaphindiweyo, le khasethi igcina imilo kunye nokusebenza kwayo, inikezela ngokuthembeka kwexesha elide kwiindawo ezifuna ukwenziwa.
Ubunjineli obuchanekileyo bokuPhathwa ngokuKhuselekileyoISemicera PFA Cassetteibonisa ubunjineli obuchanekileyo obuqinisekisa ukuphathwa kwe-wafer ekhuselekileyo kunye nozinzile. I-slot nganye yenzelwe ngononophelo ukubamba ama-wafers ngokukhuselekileyo, ukuthintela nayiphi na intshukumo okanye ukutshintshwa okunokubangela umonakalo. Ubunjineli obuchanekileyo buxhasa ukubekwa kwe-wafer okungaguqukiyo kunye nokuchanekileyo, okunegalelo ekusebenzeni kakuhle kwenkqubo.
Usetyenziso Oluguquguqukayo Kuzo Zonke IinkquboEnkosi kwiipropati zayo eziphezulu eziphathekayo, iPFA CassetteIsebenza ngeendlela ezininzi ngokwaneleyo ukuba isetyenziswe kuwo wonke amanqanaba okwenziwa kwe-semiconductor. Ifaneleke ngakumbi ukufakwa okumanzi, i-chemical vapor deposition (CVD), kunye nezinye iinkqubo ezibandakanya imo engqongileyo yeekhemikhali. Ukuguquguquka kwayo kuyenza ibe sisixhobo esibalulekileyo ekugcineni ingqibelelo yenkqubo kunye nomgangatho we-wafer.
Ukuzibophelela kuMgangatho kunye noTshintshoKwi-Semicera, sizimisele ukubonelela ngeemveliso ezihlangabezana nemigangatho ephezulu yoshishino. IPFA Cassettengumzekelo woku kuzibophelela, ukunika isisombululo esithembekileyo esidibanisa ngokungenamthungo kwiinkqubo zakho zokuvelisa. Ikhasethi nganye iphantsi kolawulo olungqongqo lomgangatho ukuqinisekisa ukuba iyahlangabezana nemigaqo yethu yokusebenza ngokungqongqo, inika ukugqwesa okulindeleyo kwiSemicera.
| Izinto | Imveliso | Uphando | Dummy |
| Iiparamitha zeCrystal | |||
| Iipolytype | 4H | ||
| Imposiso yokuma kumphezulu | <11-20>4±0.15° | ||
| Iiparamitha zoMbane | |||
| I-Dopant | n-uhlobo lweNitrojeni | ||
| Ukuxhathisa | 0.015-0.025ohm · cm | ||
| IiParameters zoomatshini | |||
| Ububanzi | 150.0±0.2mm | ||
| Ukutyeba | 350±25 μm | ||
| Ukuqhelaniswa neflethi ephambili | [1-100] ± 5 ° | ||
| Ubude beflethi bokuqala | 47.5±1.5mm | ||
| Iflethi yesibini | Akukho nanye | ||
| TTV | ≤5 μm | ≤10 μm | ≤15 μm |
| LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
| Ukuqubuda | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
| I-Wap | ≤35 μm | ≤45 μm | ≤55 μm |
| Ngaphambili(Si-face) uburhabaxa(AFM) | Ra≤0.2nm (5μm*5μm) | ||
| Ulwakhiwo | |||
| Ukuxinana kweMibhobho | <1 iya/cm2 | <10 i/cm2 | <15 i/cm2 |
| Ukungcola kwesinyithi | ≤5E10athom/cm2 | NA | |
| I-BPD | ≤1500 i-ea/cm2 | ≤3000 i/cm2 | NA |
| TSD | ≤500 i/cm2 | ≤1000 nge-cm2 | NA |
| Umgangatho wangaphambili | |||
| Ngaphambili | Si | ||
| Ukugqitywa komphezulu | Si-ubuso CMP | ||
| Amacandelo | ≤60ea/wafer (ubukhulu≥0.3μm) | NA | |
| Imikrwelo | ≤5ea/mm. Ubude obongezelekayo ≤Ububanzi | Ubude obongezelekayo≤2*Ububanzi | NA |
| Amaxolo e-orenji/imingxuma/amabala/imivimbo/ iintanda/ungcoliseko | Akukho nanye | NA | |
| Iitshiphusi ze-Edge/i-idents/fracture/hex plates | Akukho nanye | ||
| Iindawo zePolytype | Akukho nanye | Indawo eyongezelekayo≤20% | Indawo eyongezelekayo≤30% |
| Ukumakishwa kwelaser yangaphambili | Akukho nanye | ||
| Umgangatho wasemva | |||
| Emva kokugqiba | C-ubuso CMP | ||
| Imikrwelo | ≤5ea/mm,Ubude obongezelekayo≤2*Ububanzi | NA | |
| Iziphene zangasemva (iitshiphusi zomphetho/iindents) | Akukho nanye | ||
| Umqolo uburhabaxa | Ra≤0.2nm (5μm*5μm) | ||
| Ukumakishwa kwelaser yangasemva | 1 mm (ukusuka kumphetho ophezulu) | ||
| Edge | |||
| Edge | Chamfer | ||
| Ukupakishwa | |||
| Ukupakishwa | I-Epi ilungele ukupakishwa kwevacuum Ukupakishwa kweekhasethi ezininzi | ||
| *Amanqaku: "NA" ithetha ukuba akukho sicelo Izinto ezingakhankanywanga zinokubhekisa kwi-SEMI-STD. | |||
