I-PART/1CVD (i-Chemical Vapor Deposition) indlela:Kwi-900-2300℃, kusetyenziswa i-TaCl5 kunye ne-CnHm njengemithombo ye-tantalum kunye nekhabhoni, i-H₂ njenge-atmosfera yokunciphisa, i-Ar₂njengegesi yokuthwala, ifilimu yokuphendula. Ingubo elungiselelwe i-compact, iyunifomu kunye nokucoceka okuphezulu. Nangona kunjalo, kukho iingxaki ...
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