I-InP kunye ne-CdTe Substrate

Inkcazelo emfutshane:

Izisombululo ze-InP ze-Semicera kunye ne-CdTe Substrate zenzelwe usetyenziso oluphezulu kwi-semiconductor kunye namashishini ombane welanga. I-InP yethu (i-Indium Phosphide) kunye ne-CdTe (i-Cadmium Telluride) zibonelela ngeepropati zemathiriyeli ezikhethekileyo, kubandakanywa ukusebenza kakuhle okuphezulu, ukuqhutywa kombane okugqwesileyo, kunye nozinzo olomeleleyo lwe-thermal. Ezi substrates zilungele ukusetyenziswa kwizixhobo eziphambili ze-optoelectronic, i-high-frequency transistors, kunye neeseli zelanga zefilimu ezincinci, ezibonelela ngesiseko esithembekileyo sobuchwepheshe bokusika.


Iinkcukacha zeMveliso

Iithegi zeMveliso

NgeSemicera'sI-InP kunye ne-CdTe Substrate, unokulindela umgangatho ophezulu kunye nobunjineli obuchanekileyo ukuhlangabezana neemfuno ezithile zeenkqubo zakho zokuvelisa. Nokuba zenzelwe usetyenziso lwe-photovoltaic okanye izixhobo ze-semiconductor, ii-substrates zethu zenzelwe ukuqinisekisa ukusebenza kakuhle, ukuqina, kunye nokungaguquguquki. Njengomthengisi othembekileyo, i-Semicera izimisele ukuhambisa izisombululo ze-substrate ezikumgangatho ophezulu, ezinokwenziwa ngokwezifiso eziqhuba izinto ezintsha kumacandelo ombane kunye nokuhlaziywa kwamandla.

IiPropati zeCrystalline kunye nezoMbane1

Uhlobo
I-Dopant
EPD (cm–2(Jonga ngezantsi A.)
DF (indawo eMahala isiphene) (cm2, Bona ngezantsi B.)
c/(ccm–3
Ukuhamba (y cm2/Vs)
I-Resistivit (y Ω・cm)
n
Sn
≦5×104
≦1×104
≦5×103
──────
 

(0.5〜6)×1018
──────
──────
n
S
──────
≧ 10(59.4%)
≧ 15 (87%) .4
(2〜10)×1018
──────
──────
p
Zn
──────
≧ 10(59.4%)
≧ 15(87%).
(3〜6)×1018
──────
──────
SI
Fe
≦5×104
≦1×104
──────
──────
──────
≧ 1×106
n
akukho nanye
≦5×104
──────
≦1×1016
≧ 4×103
──────
1 Eminye ingcaciso iyafumaneka xa iceliwe.

A.13 Amanqaku aphakathi

1. Ukuxinana komngxuma we-etch yokushenxiswa kulinganiswa ngamanqaku ali-13.

2. Umyinge womlinganiselo wommandla woxinaniso lwe-dislocation ubalwa.

Umlinganiselo woMmandla we-B.DF (kwimeko yesiQinisekiso soMmandla)

1. Ukuxinana komngxuma we-etch wokushenxiswa kwamanqaku angama-69 aboniswe njengasekunene kubalwa.

2. I-DF ichazwa njenge-EPD ngaphantsi kwe-500cm–2
3. Ubuninzi bendawo yeDF ilinganiswe ngale ndlela yi-17.25cm2
I-InP kunye ne-CdTe Substrate (2)
I-InP kunye ne-CdTe Substrate (1)
I-InP kunye ne-CdTe Substrate (3)

I-InP enye ye-Crystal Substrates iiNkcazo eziqhelekileyo

1. Ukuqhelaniswa
Ukuqhelaniswa nomphezulu (100)±0.2º okanye (100)±0.05º
Umphezulu wokuqhelaniswa nomphezulu uyafumaneka xa uceliwe.
Ukuqhelaniswa neflethi YE: (011)±1º okanye (011)±0.1º UKUBA: (011)±2º
Icatshulwe kwi-OF iyafumaneka xa iceliwe.
2. Ukumakishwa kweLaser okusekelwe kumgangatho we-SEMI kuyafumaneka.
3. Iphakheji yomntu ngamnye, kunye nephakheji yegesi ye-N2 ziyafumaneka.
4. I-Etch-and-pack in N2 gas iyafumaneka.
5. Ii-wafers ezixande ziyafumaneka.
Ubalulo olungentla lukumgangatho we-JX'.
Ukuba ezinye iinkcukacha ziyafuneka, nceda ubuze kuthi.

Ukuqhelaniswa

 

I-InP kunye ne-CdTe Substrate (4)(1)
Semicera Indawo yokusebenzela
Indawo yokusebenza yeSemicera 2
Umatshini wezixhobo
Ukucutshungulwa kwe-CNN, ukucocwa kweekhemikhali, ukugquma kwe-CVD
Semicera Ware House
Inkonzo yethu

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