I-3C-SiC Wafer Substrate

Inkcazelo emfutshane:

I-Semicera 3C-SiC Wafer Substrates ibonelela nge-conductivity ephezulu ye-thermal kunye ne-voltage ephezulu yokutshatyalaliswa kombane, ilungele izixhobo zombane ze-elektroniki kunye ne-high-frequency. Ezi substrates zenziwe ngokuchaneka-zobunjineli ukuze zisebenze ngokugqibeleleyo kwiindawo ezinobunzima, ziqinisekisa ukuthembeka nokusebenza kakuhle. Khetha iSemicera yezisombululo ezintsha neziphucukileyo.


Iinkcukacha zeMveliso

Iithegi zeMveliso

I-Semicera 3C-SiC Wafer Substrates zenzelwe ukubonelela ngeqonga elomeleleyo lesizukulwana esilandelayo sombane wamandla kunye nezixhobo eziphezulu ze-frequency. Ngeempawu eziphezulu ze-thermal kunye neempawu zombane, ezi substrates zenzelwe ukuhlangabezana neemfuno ezifunekayo zobuchwepheshe bale mihla.

I-3C-SiC (i-Cubic Silicon Carbide) isakhiwo se-Semicera Wafer Substrates inikezela ngeenzuzo ezizodwa, kubandakanywa ukuhanjiswa kwe-thermal ephezulu kunye ne-coefficient yokwandisa i-thermal ephantsi xa kuthelekiswa nezinye izinto ze-semiconductor. Oku kubenza babe lolona khetho lubalaseleyo kwizixhobo ezisebenza phantsi kobushushu obugqithisileyo kunye neemeko zamandla aphezulu.

Ngombane ophezulu wokuphuka kombane kunye nokuzinza okuphezulu kweekhemikhali, i-Semicera 3C-SiC Wafer Substrates iqinisekisa ukusebenza okuhlala ixesha elide kunye nokuthembeka. Ezi zakhiwo zibaluleke kakhulu kwizicelo ezifana ne-radar ephezulu-frequency, ukukhanya kwe-slid-state, kunye nee-inverters zamandla, apho ukusebenza kakuhle kunye nokuqina kubaluleke kakhulu.

Ukuzibophelela kweSemicera kumgangatho kubonakaliswa kwinkqubo yokwenziwa ngobunono kwe-3C-SiC Wafer Substrates yabo, iqinisekisa ukufana kunye nokungaguquguquki kwibhetshi nganye. Oku kuchanekileyo kunegalelo ekusebenzeni ngokubanzi kunye nobomi obude bezixhobo zombane ezakhelwe phezu kwazo.

Ngokukhetha i-Semicera 3C-SiC Wafer Substrates, abavelisi bafumana ukufikelela kwizinto ezinqamlekileyo ezivumela ukuphuhliswa kwezinto ezincinci, ngokukhawuleza, kunye nokusebenza kakuhle kwe-elektroniki. I-Semicera iyaqhubeka nokuxhasa ukutsha kwezobuchwepheshe ngokubonelela ngezisombululo ezithembekileyo ezihlangabezana neemfuno eziguqukayo zeshishini le-semiconductor.

Izinto

Imveliso

Uphando

Dummy

Iiparamitha zeCrystal

Iipolytype

4H

Imposiso yokuma kumphezulu

<11-20>4±0.15°

Iiparamitha zoMbane

I-Dopant

n-uhlobo lweNitrojeni

Ukuxhathisa

0.015-0.025ohm · cm

IiParameters zoomatshini

Ububanzi

150.0±0.2mm

Ukutyeba

350±25 μm

Ukuqhelaniswa neflethi ephambili

[1-100] ± 5 °

Ubude beflethi bokuqala

47.5±1.5mm

Iflethi yesibini

Akukho nanye

TTV

≤5 μm

≤10 μm

≤15 μm

LTV

≤3 μm(5mm*5mm)

≤5 μm(5mm*5mm)

≤10 μm(5mm*5mm)

Ukuqubuda

-15μm ~ 15μm

-35μm ~ 35μm

-45μm ~ 45μm

I-Wap

≤35 μm

≤45 μm

≤55 μm

Ngaphambili(Si-face) uburhabaxa(AFM)

Ra≤0.2nm (5μm*5μm)

Ulwakhiwo

Ukuxinana kweMibhobho

<1 iya/cm2

<10 i/cm2

<15 i/cm2

Ukungcola kwesinyithi

≤5E10athom/cm2

NA

I-BPD

≤1500 i-ea/cm2

≤3000 i/cm2

NA

TSD

≤500 i/cm2

≤1000 nge-cm2

NA

Umgangatho wangaphambili

Ngaphambili

Si

Ukugqitywa komphezulu

Si-ubuso CMP

Amacandelo

≤60ea/wafer (ubukhulu≥0.3μm)

NA

Imikrwelo

≤5ea/mm. Ubude obongezelekayo ≤Ububanzi

Ubude obongezelekayo≤2*Ububanzi

NA

Amaxolo e-orenji/imingxuma/amabala/imivimbo/ iintanda/ungcoliseko

Akukho nanye

NA

Iitshiphusi ze-Edge/i-idents/fracture/hex plates

Akukho nanye

Iindawo zePolytype

Akukho nanye

Indawo eyongezelekayo≤20%

Indawo eyongezelekayo≤30%

Ukumakishwa kwelaser yangaphambili

Akukho nanye

Umgangatho wasemva

Emva kokugqiba

C-ubuso CMP

Imikrwelo

≤5ea/mm,Ubude obongezelekayo≤2*Ububanzi

NA

Iziphene zangasemva (iitshiphusi zomphetho/iindents)

Akukho nanye

Umqolo uburhabaxa

Ra≤0.2nm (5μm*5μm)

Ukumakishwa kwelaser yangasemva

1 mm (ukusuka kumphetho ophezulu)

Edge

Edge

Chamfer

Ukupakishwa

Ukupakishwa

I-Epi ilungele ukupakishwa kwevacuum

Ukupakishwa kweekhasethi ezininzi

*Amanqaku: "NA" ithetha ukuba akukho sicelo Izinto ezingakhankanywanga zinokubhekisa kwi-SEMI-STD.

ubuchwephesha_1_2_ubungakanani
Iifafa zeSiC

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