Semiceraunebhongo ukunika iI-30mm yeAluminiyam ye-Nitride Wafer Substrate, imathiriyeli ekumgangatho ophezulu eyenzelwe ukuhlangabezana neemfuno ezingqongqo zezicelo zale mihla zombane kunye ne-optoelectronic. I-Aluminiyam Nitride (i-AlN) substrates idume ngokugqwesa kwe-thermal conductivity kunye neempawu zokugquma umbane, okuzenza zibe lukhetho olufanelekileyo kwizixhobo zokusebenza eziphezulu.
Ezona mpawu:
• I-Exceptional Thermal Conductivity: II-30mm yeAluminiyam ye-Nitride Wafer Substrateiqhayisa nge-thermal conductivity ukuya kwi-170 W / mK, iphezulu kakhulu kunezinye izinto ze-substrate, iqinisekisa ukutshatyalaliswa kobushushu obusebenzayo kwizicelo eziphezulu zamandla.
•I-Insulation ephezulu yoMbane: Ngeempawu ezigqwesileyo zokugquma umbane, le substrate inciphisa intetho enqamlezayo kunye nokuphazamiseka komqondiso, iyenze ilungele usetyenziso lwe-RF kunye ne-microwave.
•Ukomelela koomatshini: II-30mm yeAluminiyam ye-Nitride Wafer Substrateinikeza amandla aphezulu omatshini kunye nokuzinza, ukuqinisekisa ukuqina kunye nokuthembeka naphantsi kweemeko zokusebenza ezinzima.
•Ii-Aplikeshini ezininzi: Le substrate ilungele ukusetyenziswa kwii-LED ezinamandla aphezulu, ii-laser diode, kunye namacandelo e-RF, ibonelela ngesiseko esomeleleyo nesithembekileyo kwiiprojekthi zakho ezifuna kakhulu.
•Ukwenziwa ngokuchanekileyo: I-Semicera iqinisekisa ukuba i-wafer substrate nganye yenziwe ngokuchaneka okuphezulu, inika ubukhulu obufanayo kunye nomgangatho womhlaba ukuhlangabezana nemigangatho echanekileyo yezixhobo zombane eziphezulu.
Yandisa ukusebenza kakuhle kunye nokuthembeka kwezixhobo zakho ngeSemicera'sI-30mm yeAluminiyam ye-Nitride Wafer Substrate. Ii-substrates zethu ziyilelwe ukuhambisa ukusebenza okuphezulu, ukuqinisekisa ukuba iinkqubo zakho ze-elektroniki kunye ne-optoelectronic zisebenza ngokusemandleni azo. Thembela i-Semicera ngezinto eziphucukileyo ezikhokelela kwishishini kumgangatho kunye nokutsha.
| Izinto | Imveliso | Uphando | Dummy |
| Iiparamitha zeCrystal | |||
| Iipolytype | 4H | ||
| Imposiso yokuma kumphezulu | <11-20>4±0.15° | ||
| Iiparamitha zoMbane | |||
| I-Dopant | n-uhlobo lweNitrojeni | ||
| Ukuxhathisa | 0.015-0.025ohm · cm | ||
| IiParameters zoomatshini | |||
| Ububanzi | 150.0±0.2mm | ||
| Ukutyeba | 350±25 μm | ||
| Ukuqhelaniswa neflethi ephambili | [1-100] ± 5 ° | ||
| Ubude beflethi bokuqala | 47.5±1.5mm | ||
| Iflethi yesibini | Akukho nanye | ||
| TTV | ≤5 μm | ≤10 μm | ≤15 μm |
| LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
| Ukuqubuda | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
| I-Wap | ≤35 μm | ≤45 μm | ≤55 μm |
| Ngaphambili(Si-face) uburhabaxa(AFM) | Ra≤0.2nm (5μm*5μm) | ||
| Ulwakhiwo | |||
| Ukuxinana kweMibhobho | <1 iya/cm2 | <10 i/cm2 | <15 i/cm2 |
| Ukungcola kwesinyithi | ≤5E10athom/cm2 | NA | |
| I-BPD | ≤1500 i-ea/cm2 | ≤3000 i/cm2 | NA |
| TSD | ≤500 i/cm2 | ≤1000 nge-cm2 | NA |
| Umgangatho wangaphambili | |||
| Ngaphambili | Si | ||
| Ukugqitywa komphezulu | Si-ubuso CMP | ||
| Amacandelo | ≤60ea/wafer (ubukhulu≥0.3μm) | NA | |
| Imikrwelo | ≤5ea/mm. Ubude obongezelekayo ≤Ububanzi | Ubude obongezelekayo≤2*Ububanzi | NA |
| Amaxolo e-orenji/imingxuma/amabala/imivimbo/ iintanda/ungcoliseko | Akukho nanye | NA | |
| Iitshiphusi ze-Edge/i-idents/fracture/hex plates | Akukho nanye | ||
| Iindawo zePolytype | Akukho nanye | Indawo eyongezelekayo≤20% | Indawo eyongezelekayo≤30% |
| Ukumakishwa kwelaser yangaphambili | Akukho nanye | ||
| Umgangatho wasemva | |||
| Emva kokugqiba | C-ubuso CMP | ||
| Imikrwelo | ≤5ea/mm,Ubude obongezelekayo≤2*Ububanzi | NA | |
| Iziphene zangasemva (iitshiphusi zomphetho/iindents) | Akukho nanye | ||
| Umqolo uburhabaxa | Ra≤0.2nm (5μm*5μm) | ||
| Ukumakishwa kwelaser yangasemva | 1 mm (ukusuka kumphetho ophezulu) | ||
| Edge | |||
| Edge | Chamfer | ||
| Ukupakishwa | |||
| Ukupakishwa | I-Epi ilungele ukupakishwa kwevacuum Ukupakishwa kweekhasethi ezininzi | ||
| *Amanqaku: "NA" ithetha ukuba akukho sicelo Izinto ezingakhankanywanga zinokubhekisa kwi-SEMI-STD. | |||
